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SprayCVD-050

Laboratory CVD 2-inch tool for new process development
Spray CVD and RTP in the same reactor


Kemstream Atokit for precursor atomization

Deposition, high rate thermal profile and annealing in the same chamber

diagram1

Diagram2

Other customized configurations are available upon request

APPLICATIONS:
  • Oxides for solar cells: SnO2, ZnO, TiO2, In2O3,…
  • Semiconductors: Nb2O5,…
  • Superconductors: YBCO,…,
  • Electro-optic coatings: NiO, Co3O4,…
  • Electrochromic coatings: WO3,….
  • Ferroelectric memories: SrTiO3,…
  • Insulating barrier layers: MgO,…
  • Catalytically active coatings: Co3O4 ,NiCo2O4,…
  • Solid oxide fuel cell(SOFC): ZrO2, YSZ, GCO,…
KEY FEATURES
  • Horizontal quartz tube with stainless steel flanges
  • Lamp furnace for process up to 1200℃
  • Thermocouple control with PID temperature controller
  • Kemstream Atokit for atomization of precursor
  • PC control with Ethernet communication

PC CONTROL SOFTWARE Screen
Access modes:
Operator, Engineer, Administrator
Recipe mode:
Up to 100 steps per recipe
Process:
Full data logging
All data and table saved in process historical
Manual mode:
Manual control of heating, vacuum and gas
Autotuning procedure
Configuration mode:
Calibration tables, alarm values…


SPECIFICATIONS
SprayCVD-050
Substrate diameter 2-inch
Temperature range RT to 1200 C
Temperature control Digital PID controller
Thermocouples N type
Number of atomization units 1
Precursor injection Reactor rear flange
Gas injection Reactor rear flange
Exhaust port Front flange
Vacuum valve and gauge No

FACILITY REQUIREMENTS
SprayCVD-050
Voltage 3x400V+N or 3x220V
Power 15 kW
Water flow 8 l/mn
Compressed air 6 bars / 0.1 m3/h
Process gases 2 bars
Pressurization gas (for precursor) 7 bars

DIMENSIONS AND WEIGHT
SprayCVD-050
Width 700 mm
Height 700 mm
Depth 790 mm
Weight 90 kg