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MC050
Low cost Spray CVD & MOCVD In-situ annealing capability
APPLICATIONS:
Metal and alloys, oxides, transition metal nitrides
The Annealsys MC050 is a 2-inch MOCVD and Spray CVD reactor especially developed to meet the requirements of research and development units.
The MC050 allows doing heteroepitaxy of oxides on single crystals wafers by MOCVD using a wide range of solid and liquid organometallic precursors. Spray CVD version is also available.
The MC050 system can be provided with direct injection vaporizer allowing the widest range of utilization of precursors for development of new materials
The infrared lamp heating system provides in-situ annealing process capability in the deposition chamber.
PERFORMANCE CHARACTERISTICS
Low cost Spray CVD & MOCVD In-situ annealing capability
APPLICATIONS:
Metal and alloys, oxides, transition metal nitrides
- Semiconductor: SiO2, HfO2, Ta2O5, Cu, TiN, TaN…
- High k Dielectric: SrTiO3, BaTiO3, Ba(1-x)SrxTiO3 (BST)
- Ferroelectric: SBT, SBTN, PLZT, PZT,…
- Superconductor: YBCO, Bi-2223, Bi-2212, Tl-1223, …
- Piezoelectric: (Pb, Sr)(Zr,Ti)O3, Modified Lead Titanate
- Colossal Magneto Resistance
- Thermal coatings
- Buffer layers
- Mechanical coatings
- Optics
The Annealsys MC050 is a 2-inch MOCVD and Spray CVD reactor especially developed to meet the requirements of research and development units.
The MC050 allows doing heteroepitaxy of oxides on single crystals wafers by MOCVD using a wide range of solid and liquid organometallic precursors. Spray CVD version is also available.
The MC050 system can be provided with direct injection vaporizer allowing the widest range of utilization of precursors for development of new materials
The infrared lamp heating system provides in-situ annealing process capability in the deposition chamber.
PERFORMANCE CHARACTERISTICS
- Temperature range: RT to 1200°C
- Gas mixing capability with mass flow controllers
- Vacuum range: Atmosphere to 10-3 Torr.
| General features | |
| Maximum substrate diameter | 2-inch |
| Process chamber | Quartz and stainless steel |
| Heating | Halogen lamps |
| Temperature control | Thermocouple temperature control Digital PID temperature controllers |
| Vacuum, gas and liquid | Purge gas line with needle valve Up to 6 process gas lines with mass flow controllers Up to 4 vaporizer units selected function of liquid precursors Custom liquid panel depending on the application Vacuum valve and vacuum gauge Optional vacuum rotary of dry pump Optional pressure control with throttle valve |
| Control | Full PC control |
| Facilities | Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60
Hz Power: 10 kW Water: 2 to 6 bars, pressure drop 1 bar, 10 l/mn Compressed air: 6 bars (valve actuation) Process gas fittings: VCR ¼ or Swagelok ¼ |
| Dimensions and weight | Width: 1000 mm Depth: 1000 mm Height: 1500 mm Weight: 300 kg |