Film Stress
| FSM pioneered in the laser scanning technology for Film Stress and wafer bow measurement. Several hundred of these tools have been installed in almost every fab, and R&D facilities for Si, GaAS, InP or Flat panel facilities. Systems are available for room and high temperatures |
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Features
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FSM 128 series offer the simplest and most widely adopted technique in film stress and wafer bow measurement. It is fast, simple to operate, accurate, and is a non- contact method. The tool is capable of fast 2D and 3D mapping of Stress or wafer bow.