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4 Point Probe

4PP C2C Sheet Resistance Mapping System

FSM 4PP-C2C is a production-worthy sheet resistance metrology tool used in the metals, CMP, and diffusion modules of semiconductor wafer fab. It provides stable and accurate sheet resistance for process characterization, process variation production monitoring tool qualification. With this advanced automation and edge correction capability this system enable high throughput sheet resistance mapping of both 200mm and 300mm wafer up to 1mm on the edge. Combined with flexible user interface, this system provides lower cost of the ownership.

 System specifications

  • Sheet resistance range: 1m ohm/sq ~ 1 M ohm/sq
  • Accuracy: <0.5 % of NIST standard
  • Repeatability: < 0.2 %
  • Long term repeatability: < 0.3%
  • Edge exclusion: 1mm
  • Rs contour or color map
  • Standard single probe
  • Standard single hand robot
  • Full 300mm Fab automation capabilities
  • Non-contact RsL probe for junction wafer as an option